IEEE TBIOM Special Issue on Generative AI and Large Vision-Language Models for Biometrics

CALL FOR PAPERS
IEEE Transactions on Biometrics, Behavior, and Identity Science (T-BIOM)
Special Issue on
Generative AI and Large Vision-Language Models for Biometrics

Submission Deadline: 31 May 2025
Targeted Publication: Q1 2026

Paper submission: https://ieee.atyponrex.com/journal/tbiom

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*** Motivation ***

In the rapidly advancing field of artificial intelligence, generative AI
and large-scale vision-language models are becoming key areas of
interest, revolutionizing numerous research fields, including natural
language processing and computer vision. Generative AI models are
designed and trained to approximate the underlying distribution of a
dataset, enabling the generation of new samples that reflect the
patterns and regularities within the training data. Among the various
types of generative models, such as Generative Adversarial Networks
(GANs), Variational Autoencoders (VAEs), flow-based, autoregressive, and
diffusion models, GANs and diffusion models have gained significant
attention and are widely applied to tasks such as image synthesis, image
manipulation, text generation, and speech synthesis. These models have
shown remarkable success in modeling and interpreting the probability
distributions of real-world data. Vision-language models, on the other
hand, integrate visual and textual data, learning to associate these
modalities to enhance understanding and enable multimodal
reasoning-based applications.

The advancements in generative AI and vision-language models (LVMs) are
also making a significant impact on biometrics, offering new
possibilities for addressing longstanding challenges. Generative AI,
with its ability to synthesize highly realistic data, has the potential
to address privacy concerns related to collecting, sharing, and using
sensitive biometric data. This synthetic data can also be used to
increase diversity and variation in training datasets through
augmentation, thus improving model generalizability and reducing
potential bias induced by imbalanced training data. At the same time,
large vision-language models offer the capability to process and
understand multimodal information by combining visual features with
contextual data, such as semantic insights from natural language.
Furthermore, large-scale vision-language models can be optimized for
downstream tasks, such as template extraction, using zero or few-shot
learning approaches, making them highly versatile for biometric
applications.

Although generative AI and vision-language models offer a rich set of
tools that can be utilized to address challenges in biometrics, the
misuse of these technologies presents a threat to the field. Generative
AI models have the ability to incorporate conditions in the generation
process to take control over the generated samples. This enables a wide
range of applications such as image-to-image translation, text-to-image
synthesis, and style transfer. However, this capability also allows for
creating deepfake attacks, e.g., images, videos, and audio that are
indistinguishable or nearly indistinguishable from real content. The
increased realism and widespread public accessibility of generative AI
have raised concerns about the potential misuse of this technology for
malicious purposes. This highlights the need for solutions to detect
generated AI content and mitigate the potential misuse of generative AI
models.

The proposed TBIOM special issue will provide a platform to discuss the
latest advancements and technical achievements related to Generative AI
and Large vision-language models when applied to problems in biometrics.
The topics of interest of the special issue include, but are not limited to:

+ Novel generative AI models for responsible synthesis of biometric data
+ Novel generative models for conditional data synthesis
+ Biometrics interpretability and explainability through large
language-vision models
+ Few-shot learning from large language-vision models
+ Generative AI and LVMs for detecting attacks on biometrics systems
+ Generative AI-based image restoration
+ Information leakage of synthetic data
+ Data factories and label generation for biometric models
+ Quality assessment of AI generated data
+ Synthetic data for data augmentation
+ Detection of generated AI contents
+ Bias mitigation using synthetic data
+ LLMs and VLMs for biometrics
+ Watermarking AI generated content
+ New synthetic datasets and performance benchmarks
+ Security and privacy issues regarding the use of generative AI methods
for biometrics
+ Ethical considerations regarding the use of generative AI methods for
biometrics
+ Parameter efficient fine-tuning of VLMs for biometrics applications

*** Important Dates ***

Submission deadline:                          31 May 2025
First round of reviews completed (first decision):         August 2025
Second round of reviews completed                 October 2025
Final papers due                        December 2025
Publication date:                         Q1 2026

*** Paper Submission ***

Papers should be submitted through the TBIOM submission portal before
the deadline using the TBIOM journal templates:
https://ieee.atyponrex.com/journal/tbiom and selecting the article type:
“Generative AI and Large Vision-Language Models for Biometrics”.

*** Guest Editors: ***

+ Fadi Boutros, Fraunhofer IGD, Germany
+ Hu Han, Institute of Computing Technology, Chinese Academy of Sciences
(CAS), China
+ Tempestt Neal, University of South Florida, United States
+ Vishal M. Patel, Johns Hopkins University, United States
+ Vitomir Štruc, University of Ljubljana, Slovenia
+ Yunhong Wang, Beihang University, China

Synthetic Data for Face and Gesture]: Call for Papers – held in conjunction with IEEE FG 2025

2nd International Workshop on Synthetic Data for Face and Gesture
Analysis (SD-FGA 2025)
Held in the scope of IEEE FG 2025
26 or 30 May 2025 (TBD), Clearwater, Florida, USA
https://sites.google.com/view/sd-fga-2025/home

Paper submission: 9 April 2025, 11:59pm PST
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*** Call for Papers ***
Recent advancements in generative models within the realms of computer
vision and artificial intelligence have revolutionized the way
researchers approach data-driven tasks. The advent of sophisticated
generative models, such as GANs (Generative Adversarial Networks), VAEs
(Variational Autoencoders), or more recently diffusion models, has
empowered practitioners to create synthetic data that closely mirrors
real-world scenarios. These models enable the generation of
high-fidelity images and sequences, laying the foundation for
groundbreaking applications in face and gesture analysis. The
significance of these generative models lies in their ability to produce
synthetic data that is remarkably realistic, thereby mitigating
challenges associated with data scarcity and privacy concerns. As a
result, the utilization of synthetic data has become increasingly
prevalent in various research domains, offering a versatile and ethical
alternative for training and testing machine learning algorithms.

This workshop aims to delve into the diverse applications of synthetic
data in the realm of face and gesture analysis. Participants will
explore how synthetic datasets have been instrumental in training facial
recognition systems, enhancing emotion detection models, and refining
gesture recognition algorithms. The workshop will showcase exemplary use
cases where the integration of synthetic data has not only overcome data
limitations but has also fostered the development of more robust and
accurate models. As researchers increasingly recognize the potential of
synthetic datasets in shaping the future of computer vision and machine
learning, there arises a demand for a collaborative platform where ideas
can be exchanged, methodologies shared, and challenges addressed. This
workshop aims to bridge the gap between theoretical knowledge and
practical implementation, fostering a community of experts and
enthusiasts dedicated to advancing the frontiers of synthetic data in
face and gesture analysis.

Topics of interest include, but are not limited to:
+ Novel generative techniques for producing realistic face and gesture data
+ Innovative approaches for labeling and annotating synthetic data
+ Methods for preventing data leakage in synthetic datasets
+ Development of synthetic data pipelines for biometrics
+ Techniques for using synthetic data to enrich and augment existing
datasets
+ Synthetic data as a tool for bias reduction and promoting fairness in
face and gesture analysis
+ Criteria and methodologies for assessing the quality of synthetic
datasets
+ Privacy-focused synthetic data generation for sensitive applications
+ New applications for synthetic data in areas like augmented reality,
animation, and virtual environments
+ Comparative performance benchmarks and quality assessments of
synthetic datasets

*** Paper format and submission ***

International Joint Conference on Biometrics (IJCB) 2025 – Submission Deadline: 11 April 2025

International Joint Conference on Biometrics (IJCB 2025)
8 – 11 September 2025, Osaka, Japan
https://ijcb2025.ieee-biometrics.org/

Paper submission: 11 April 2025, 11:59pm PST
*****************************

*** About IJCB 2025 ***
The IEEE International Joint Conference on Biometrics (IJCB) is the
premier international forum for research in biometrics and related
technologies. It combines two major biometrics conferences, the IEEE
Biometrics Theory, Applications, and Systems (BTAS) conference and the
International Conference on Biometrics (ICB), and is made possible
through a special agreement between the IEEE Biometrics Council and the
IAPR TC-4. IJCB 2025 is the 9th iteration of this major joint event and
will be held in Osaka, Japan between 8-11 September 2025 as an in-person
conference.

*** Call for Contributions ***
IJCB 2025 is intended to have a broad scope and invites papers that
advance biometric technologies, sensor design, feature extraction and
matching algorithms, security and privacy, and social impact of
biometrics technology. Topics of interest include, but are not limited to:

+ Face, Iris, Fingerprint, Palmprint
+ Periocular, Ear, Vein, Speech
+ Gait, Gesture and Action Recognition
+ Multi-modal and Multi-Spectral Biometrics
+ Mobile-based Biometrics
+ Template Protection and Cryptosystems
+ Privacy, Demographic Bias, Fairness
+ Biometrics Explainability and Interpretability
+ Template Design, Selection and Update
+ Datasets, Evaluation, Benchmarking
+ Performance Modelling and Prediction
+ Large scale ID Management
+ Anti-spoofing, Presentation Attack Detection
+ Biometric DeepFakes, Digital Data Forensics
+ Biometric-related Law Enforcement and Forensics
+ Biometrics in Healthcare, Banking, IoT
+ Biometric-related Synthetic Realities
+ Ethical, Social and Legal Issues

  ***Paper Submission ***
Submitted papers may not be accepted or under review elsewhere.
Submissions may be up to eight pages, plus additional references, in
conference format. Please visit the submission page for additional
details on paper formatting. Accepted papers will be submitted for
inclusion into IEEE Xplore subject to meeting IEEE Xplore’s scope and
quality requirements.

Submission is through CMT: https://cmt3.research.microsoft.com/IJCB2025.

*** Important Dates ***
+ Abstract and paper submission deadline: April 11, 2025 (11:59pm Pacific)
+ Decisions to authors: July 3, 2025
+ Camera-ready submission: July 25, 2025

*** Awards and TBIOM Special Issue ***
Several awards will be given out to the best papers from IJCB 2025,
including (1) the best paper award, (2) the best student paper award,
(3) daily best poster awards. The awards will consist of a commemorative
plaque as well as award money.

Additionally, the authors of the best-reviewed papers will be invited to
submit an extended version of their papers to a special issue of the
IEEE Transactions on Biometrics, Behavior, and Identity Science
(IEEE-TBIOM).

Contact PC: ijcb2025pcs@googlegroups.com

Ingeniería Básica en Instrumentación & Control – Últimos días de inscripción con descuento!

ÚLTIMOS DÍAS DE INSCRIPCIÓN CON DESCUENTO!!!

Ingeniería Básica en Instrumentación & Control

 7, 14, 21, 28 de abril, 5, 12, 19, 26 de mayo, 2 y 9 de junio de 17:00 a 20:00 hs 
en forma VIRTUAL por la plataforma Zoom 


 

DISERTANTES: Ings. Gustavo Klein, Osvaldo Ortega, Luis Gusmano, Norma Toneguzzo, Eduardo Alvarez, Sergio Szklanny, Fabiana Ferreira y Roberto Varela

ABSTRACT: El curso de “Ingeniería Básica en Instrumentación & Control” es una referencia para conocer los conceptos generales, criterios, tecnologías, procedimientos y documentación que se necesitan para producir la ingeniería básica en esta área, los módulos de este curso son también el punto de partida para otros cursos, caso necesites especializarte en alguna de las áreas presentadas.

OBJETIVOS:

  • El Curso está destinado a introducir los temas y problemáticas más importantes de la Ingeniería de Instrumentación y Control (I&C) para Plantas y Procesos Industriales, desde una visión general, pero abarcativa y actualizada para que al final del Curso los participantes hayan comprendido globalmente esta especialidad de Ingeniería.
  • Los cursantes comprenderán los conceptos generales, criterios, tecnologías, procedimientos y documentación que se necesitan cuando el objetivo es producir la ingeniería básica en el área de conocimiento que nos convoca.
  • El desarrollo será en modalidad virtual, se entregarán los textos de referencia de cada módulo, para consulta de los asistentes y al finalizar el certificado de participación

DIRIGIDO A:  Está destinado a todos aquellos que se desempeñan o se relacionan con tareas técnicas (técnicos, supervisores, ingenieros, personal de operación y mantenimiento de Plantas, Gerentes técnicos, etc.), que desean o necesitan introducirse en esta especialidad de la Ingeniería, para que tengan una visión general pero completa de todos los rubros y elementos principales de la I&C

 

TEMARIO:

  • 17/03 Webinar de presentación del curso – Inscripción GRATUITA AQUÍ
  • 07/04  –  MODULO 1A – Ing. GUSTAVO KLEIN
    INTRODUCCIÓN GENERAL Ingeniería Básica de I&C

    Breve explicación Organización del Curso
    Concepto de Ingeniería Básica de Plantas e Ingeniería de Instrumentos y Control.
    Esquema de introducción de un Sistema de I&C en una planta de procesos
    Breve descripción de especialidades de Ingeniería de Plantas,
    Interrelación de I&C con otras disciplinas: Procesos; Mec.; Civil, Eléctrica
    Información de base- Diagramas de Proceso y diagramas P&I.
    Instrumentos de Campo e Instrumentos cableados o en Redes.
    Introducción variables fundamentales : presión, caudal, temperatura, nivel, análisis
    Funcionamiento de las oficinas de Ingeniería.
    Proyecto  de IB, conceptos básicos s/ recursos, documentación, planificación.
    Pliegos de Ingenieria
  • 14/04  –  MODULO 2A – Ing. OSVALDO ORTEGA
    MEDICIONES GENERAL  y Introducción Variable PRESION

    Conceptos básicos y comunes a los instrumentos de medición.
    Errores, precisión y exactitud, Rango, Span, linealidad, histéresis, máximo, discriminación, corrimiento del cero, etc.
    Calibración.
    Error sobre la medición y sobre el valor.
    Conceptos de Rangeability, Ganancia,
    Introducción s/Instalación de instrumentos en áreas peligrosas-
    Conceptos básicos de instrumentos de medición de Presión.
    Presión manométrica, absoluta, diferencial, unidades.
    Manómetros , transmisores, presostatos, selección y  tecnologías
  • 21/04  –  MODULO 3A – Ing. OSVALDO ORTEGA
    Introducción Variable CAUDAL

    Conceptos básicos de instrumentos de medición de Caudal.
    Distintas tecnologías de medición de caudal.
  • 28/04  –  MODULO 4A – Ing. LUIS GUSMANO
    Introducción Variable TEMPERATURA

    Conceptos básicos de instrumentos de medición de Temperatura.
    Distintas tecnologías de medición de temperatura.
  • 05/05  –  MODULO 5A – Ing. NORMA TONEGUZZO
    Introducción Variable NIVEL

    Conceptos básicos de instrumentos de medición de Nivel.
    Distintas tecnologías de medición de nivel.
  • 12/05  –  MODULO 6A – Ing. EDUARDO ALVAREZ
    Introducción ELEMENTOS FINALES DE CONTROL

    Conceptos básicos de Elementos finales de Control
    Válvulas de Control, válvulas autoreguladoras, válvulas de bloqueo
    Válvulas globo, esféricas, mariposas, distintos servicios y características.
    Variadores de frecuencia
    Actuadores, posicionadores, accesorios.
    Introducción al Dimensionamiento-Software de Cálculo.
  • 19/05  –  MODULO 7A – Ing. SERGIO SZKLANNY
    SISTEMAS DE CONTROL, MONITOREO Y SEGURIDAD

    Concepto básico de lazo de control
    Conc. básicos de sistemas de control, continuo y secuencias, monitoreo y seg.
    Breve evol. del control (desde unilazo hasta los sistemas complejos y actuales)
    Breve descripción de sistemas DCS, PLC, SCADA, ESD, BMS, F&G, etc.
    Características básicas de los sistemas , diferencias, aplicaciones típicas
    Interfaces con operadores HMI, pantallas, reg. históricos, tend.,  alarmas, etc.
    Ubicación física de los sistemas de control, Salas de control.
    Niveles, jerarquías y funciones: técnicas, de ingeniería y admin. de los sistemas.
  • 26/05  –  MODULO 8A – Ing. SERGIO SZKLANNY
    ESTRATEGIAS DE CONTROL y aplicaciones típicas en plantas

    Concepto de estrategia de control aplicada.
    Repaso de lazo de control, control continuo.
    Introducción al diseño de las estrategias de control.
    Estrategias de control de intercambiadores de calor.
    Estrategias de control de calderas.
    Diseño de estrategias de control.
    Control en cascada, feedforward, retardos.
  • 02/06  –  MODULO 9A – Ing. FABIANA FERREIRA
    SISTEMAS DE TRANSMISIÓN DE DATOS – Señales-Redes-Buses

    Conceptos básicos de transmisión ded datos, capacidades, tipos de señales.
    Evolución de tecnologias, señales analogicas, discretas, digitales.
    Niveles y parámetros usuales de sistemas industriales de transmisión de datos.
    Sistemas analógicos y discretos: Señal 4-20 mACC, 24/30 VCC,
    Sistemas híbridos analógicos + HART
    Sistemas digitales: tecnologias fieldbus y profibus, otros
    Redes de nivel jerarquico superior, internet
    Otros sistemas industriales y redes, protocolos Modbus, etc.
    Soportes fisicos cables, fibra óptica, señales neumáticas, hidráulicas.
    Redes wireless.
  • 09/06  –  MODULO 10A – Ing. Qco. ROBERTO VARELA
    ELEMENTOS Y SISTEMAS DE SEGURIDAD – Sistemas Instrumentados

    Conceptos básicos de seguridad personal y patrimonial en Plantas]
    Elementos y Sistemas de seguridad- mecanicos, electricos, electrónicos
    Valvulas de seguridad, discos de ruptura, sensores, detectores, sistemas, etc.
    Clasificación de areas peligrosas- Plantas  con manejo de inflamables y comb.
    Sistemas Instrumentados de Seguridad. IEC61511
    Conceptos básicos de SIS y SIF, significado SIL
    Certificación de dispositivos
    Cyberseguridad

VALOR DE LOS 10 MÓDULOS       

 

PRECIOS

15% DESCUENTO
hasta el 21/03/2025!!!

Valor del curso

$1320000.-

$1122000.

Docente

$924000.-

$785400.-

Estudiante

$660000.-

$561000.-

Socio de AADECA

$924000.-

$785400.-

Los participantes del curso de INGENIERÍA BÁSICA cuentan con un 10% de descuento en las especializaciones!!

VER PROGRAMACIÓN COMPLETA DE CURSOS Y WEBINARS AQUÍ


Consultas a cursos@aadeca.org o por whatsapp 011 3201-2325

Call for Participation – SHREC 2025: Retrieval and Segmentation of Multiple Relief Patterns

We invite you to participate in the SHREC 2025 track on “Retrieval and Segmentation of Multiple Relief Patterns”.

Relief patterns (or geometric textures) can be defined as a repeated pattern of local surface corrugation, independent of the global shape of the object or the photometric properties of the surface.
The analysis of relief patterns has applications in various fields requiring the characterization of regular (or quasi-regular) structures, such as fabric inspection, medical imaging, and the restoration of historic artifacts.

The study of relief patterns remains an underexplored problem within 3D shape analysis, which has traditionally focused on tasks such as shape correspondence, classification, and segmentation of parts or instances.
Nonetheless, with the release of increasingly large and complex datasets (e.g, Objaverse-XL), there is a growing need for powerful tools capable of analyzing objects across multiple scales, taking into account both global and local geometric properties.
This track focuses on the local characteristics of an object, which can convey critical information about material properties or semantic attributes that may be difficult to extract when considering only the shape of the object.
The track is structured into a main task and an optional challenge.
Participants are required to solve two problems:
  1.  Pattern retrieval: Given a query mesh, participants are required to identify whether and where the relief patterns present in the query are located on the surface of a 3D model from a retrieval dataset.
  2. Optional challenge – Pattern segmentation: Participants are required to segment the different relief patterns present on the surface of 3D models in the query dataset.
For more detailed information on the track, registration, and important dates, please visit the official track webpage.
Participants are invited to submit their results along with a description of their methods, which will be included in a joint paper.
All participants will be co-authors of the track paper, which will be submitted to and published upon acceptance in the international journal Computer & Graphics.
If you have any questions, please do not hesitate to contact Gabriele Paolini (email: gabriele.paolini1@unifi.it).
Feel free to share this invitation email with colleagues, students, and anyone who may be interested.
We look forward to your participation in SHREC 2025.
Best regards,
Gabriele Paolini, University of Florence
Claudio Tortorici, Technology Innovation Institute
Stefano Berretti, University of Florence

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